| ID | 34161 |
| FullText URL | |
| Author |
Fujioka, Shinsuke
Nishimura, Hiroaki
Nishihara, Katsunobu
Sunahara, Atsushi
Okuno, Tomoharu
Ueda, Nobuyoshi
Ando, Tsuyoshi
Tao, Yezheng
Shimada, Yoshinori
Hashimoto, Kazuhisa
Yamaura, Michiteru
Shigemori, Keisuke
Nakai, Mitsuo
Nagai, Keiji
Norimatsu, Takayoshi
Miyanaga, Noriaki
Izawa, Yasukazu
Mima, Kunioki
|
| Abstract | Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses. |
| Keywords | emission
targets
lithography
fusion
|
| Note | Digital Object Identifer:10.1103/PhysRevLett.95.235004
Published with permission from the copyright holder. This is the institute's copy, as published in Physical Review Letters, November 2005, Volume 95, Issue 23, Pages 4. Publisher URL:http://dx.doi.org/10.1103/PhysRevLett.95.235004 Direct access to Thomson Web of Science record Copyright © 2005 The American Physical Society. All rights reserved. |
| Published Date | 2005-11
|
| Publication Title |
Physical Review Letters
|
| Volume | volume95
|
| Issue | issue23
|
| Content Type |
Journal Article
|
| language |
English
|
| Refereed |
True
|
| DOI | |
| Web of Science KeyUT | |
| Submission Path | physics_general/19
|
