ID | 34161 |
フルテキストURL | |
著者 |
Fujioka, Shinsuke
Osaka University
Nishimura, Hiroaki
Osaka University
Nishihara, Katsunobu
Osaka University
Sunahara, Atsushi
Institute for Laser Technology
Okuno, Tomoharu
Osaka University
Ueda, Nobuyoshi
Osaka University
Ando, Tsuyoshi
Osaka University
Tao, Yezheng
Osaka University
Shimada, Yoshinori
Institute for Laser Technology
Hashimoto, Kazuhisa
Institute for Laser Technology
Yamaura, Michiteru
Institute for Laser Technology
Shigemori, Keisuke
Osaka University
Nakai, Mitsuo
Osaka University
Nagai, Keiji
Osaka University
Norimatsu, Takayoshi
Osaka University
Miyanaga, Noriaki
Osaka University
Izawa, Yasukazu
Osaka University
Mima, Kunioki
Osaka University
|
抄録 | Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses. |
キーワード | emission
targets
lithography
fusion
|
備考 | Digital Object Identifer:10.1103/PhysRevLett.95.235004
Published with permission from the copyright holder. This is the institute's copy, as published in Physical Review Letters, November 2005, Volume 95, Issue 23, Pages 4. Publisher URL:http://dx.doi.org/10.1103/PhysRevLett.95.235004 Direct access to Thomson Web of Science record Copyright © 2005 The American Physical Society. All rights reserved. |
発行日 | 2005-11
|
出版物タイトル |
Physical Review Letters
|
巻 | 95巻
|
号 | 23号
|
資料タイプ |
学術雑誌論文
|
言語 |
英語
|
査読 |
有り
|
DOI | |
Web of Science KeyUT | |
Submission Path | physics_general/19
|