このエントリーをはてなブックマークに追加
ID 34143
FullText URL
Author
Nagano, Takayuki
Sugiyama, Hiroyuki
Kuwahara, Eiji
Watanabe, Rie
Kusai, Haruka
Kashino, Yoko
Abstract

A fullerene field-effect transistor (FET) device has been fabricated with thin films of C88, and n-channel normally-on depletion-type FET properties have been found in this FET device. The C88 FET exhibited a high mobility, μ, of 2.5 x 10-3 cm2 V-1 s-1 at 300 K, in fullerene FETs. The carrier transport showed a thermally-activated hopping transport. The n-channel normally-on FET properties and the hopping transport reflect the small mobility gap and low carrier concentration in the channel region of C88 thin-films.

Keywords
fullerene devices
field effect transistors
carrier density
carrier mobility
hopping conduction
Note
Digital Object Identifier:10.1063/1.1994957
Published with permission from the copyright holder. This is the institute's copy, as published in Applied Physics Letters, 11 July 2005, 87, 023501, (3 Pages).
Publisher URL:http://dx.doi.org/10.1063/1.1994957
Copyright © 2006 American Institute of Physics. All rights reserved.
Published Date
2005-7
Publication Title
Applied Physics Letters
Volume
volume87
Issue
issue2
Start Page
023501
End Page
023501
Content Type
Journal Article
language
English
Refereed
True
DOI
Submission Path
physics_general/4