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Ishiyama, Takeshi
Ishiyama, Takeshi
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Formation of low-resistivity region in p-Si substrate of SiGe/Si episystem by remote-hydrogen plasma treatment
Author
Yamashita, Yoshifumi
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Sakamoto, Yoshifumi
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Kamiura, Yoichi
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Ishiyama, Takeshi
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Published Date
2008-06-29
Publication Title
Physica B-Condensed Matter
Volume
volume401
Content Type
Journal Article
