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ID 34143
フルテキストURL
著者
Nagano, Takayuki Okayama University
Sugiyama, Hiroyuki Okayama University
Kuwahara, Eiji Okayama University
Watanabe, Rie Okayama University
Kusai, Haruka Okayama University
Kashino, Yoko Okayama University
Kubozono, Yoshihiro Okayama University ORCID Kaken ID publons researchmap
抄録

A fullerene field-effect transistor (FET) device has been fabricated with thin films of C88, and n-channel normally-on depletion-type FET properties have been found in this FET device. The C88 FET exhibited a high mobility, μ, of 2.5 x 10-3 cm2 V-1 s-1 at 300 K, in fullerene FETs. The carrier transport showed a thermally-activated hopping transport. The n-channel normally-on FET properties and the hopping transport reflect the small mobility gap and low carrier concentration in the channel region of C88 thin-films.

キーワード
fullerene devices
field effect transistors
carrier density
carrier mobility
hopping conduction
備考
Digital Object Identifier:10.1063/1.1994957
Published with permission from the copyright holder. This is the institute's copy, as published in Applied Physics Letters, 11 July 2005, 87, 023501, (3 Pages).
Publisher URL:http://dx.doi.org/10.1063/1.1994957
Copyright © 2006 American Institute of Physics. All rights reserved.
発行日
2005-7
出版物タイトル
Applied Physics Letters
87巻
2号
開始ページ
023501
終了ページ
023501
資料タイプ
学術雑誌論文
言語
英語
査読
有り
DOI
Submission Path
physics_general/4