ID | 67927 |
Author |
Niki, Yuta
Division of Applied Chemistry, Graduate School of Environmental, Life, Natural Science and Technology, Okayama University
Mitsudo, Koichi
Division of Applied Chemistry, Graduate School of Environmental, Life, Natural Science and Technology, Okayama University
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Sato, Eisuke
Division of Applied Chemistry, Graduate School of Environmental, Life, Natural Science and Technology, Okayama University
Suga, Seiji
Division of Applied Chemistry, Graduate School of Environmental, Life, Natural Science and Technology, Okayama University
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Abstract | Catalysts for Claisen rearrangement have been intensively studied to overcome the need for high temperature. However, previous studies have encountered challenges, such as the need for heating, a long reaction time, and/or the need for equivalent amounts of catalyst. In this study, we introduce an effective electrogenerated boron-based Lewis acid catalyst for the aromatic Claisen rearrangement, which proceeds in a few minutes at ambient temperature. Generation of the electrogenerated Lewis acid catalyst is discussed based on NMR analysis and DFT calculations.
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Note | This document is the Accepted Manuscript version of a Published Work that appeared in final form in Organic Letters, copyright © 2024 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acs.orglett.4c03928.
This fulltext file will be available in Dec. 2025.
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Published Date | 2024-12-16
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Publication Title |
Organic Letters
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Volume | volume26
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Issue | issue51
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Publisher | American Chemical Society (ACS)
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Start Page | 11111
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End Page | 11116
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ISSN | 1523-7060
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NCID | AA11347843
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Content Type |
Journal Article
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language |
English
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OAI-PMH Set |
岡山大学
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Copyright Holders | © 2024 American Chemical Society
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File Version | author
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Related Url | isVersionOf https://doi.org/10.1021/acs.orglett.4c03928
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Funder Name |
Japan Science and Technology Agency
Japan Society for the Promotion of Science
Ministry of Education, Culture, Sports, Science and Technology
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助成番号 | JPMJSP2126
22K05115
22H02122
23K13748
21H05207
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