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ID 15469
Eprint ID
15469
フルテキストURL
著者
Kamiyabu, Hideto Department of Mechanical Engineering
榊原 精 Department of Mechanical Engineering
Maeda, Hironobu Faculty of Science
飛田 守孝 Department of Mechanical Engineering
抄録
Surface tension (γ(L)) and contact angle (θ) of gallium related to wettability on Teflon and other substrates (Al(2)O(3), SiO(2), glass, graphite, BN, AI, Ni, As etc.) were investigated. The values of Teflon were 0.70(6)N/m and 158° in pure argon atmosphere, and the ones of other substrates were listed in a table in this text. We were interested especially in the relative values, γ(L)'s, on the substrates as compared with γ(L) on Teflon substrate. Liquid Ga showed spreading wetting on pure Ni metal and adhesional wetting on Al (supposed to be covered by A1(2)O(3)) and on metallic polycrystal As. Surface tension of Ga was remarkably decreased by a kind of oxide contamination due to oxygen in air. The surface layer coated by the contamination was of amorphous state nearly same as liquid Ga. The amorphous coat caused liquid Ga rather high supercooling of △T~35K. It seems that the contamination layer (oxide fi1m) smeared the crystal nucleation sites on the free surface of liquid Ga
発行日
1989-03-30
出版物タイトル
Memoirs of the Faculty of Engineering, Okayama University
出版物タイトル(別表記)
岡山大学工学部紀要
23巻
2号
出版者
Faculty of Engineering, Okayama University
出版者(別表記)
岡山大学工学部
開始ページ
1
終了ページ
8
ISSN
0475-0071
NCID
AA10699856
資料タイプ
紀要論文
言語
English
論文のバージョン
publisher
査読
無し
Eprints Journal Name
mfe