ID | 15469 |
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Sort Key | 1
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フルテキストURL | |
著者 |
Kamiyabu, Hideto
Department of Mechanical Engineering
榊原 精
Department of Mechanical Engineering
Maeda, Hironobu
Faculty of Science
飛田 守孝
Department of Mechanical Engineering
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抄録 | Surface tension (γ(L)) and contact angle (θ) of gallium related to wettability on Teflon and other substrates (Al(2)O(3), SiO(2), glass, graphite, BN, AI, Ni, As etc.) were investigated. The values of Teflon were 0.70(6)N/m and 158° in pure argon atmosphere, and the ones of other substrates were listed in a table in this text. We were interested especially in the relative values, γ(L)'s, on the substrates as compared with γ(L) on Teflon substrate. Liquid Ga showed spreading wetting on pure Ni metal and adhesional wetting on Al (supposed to be covered by A1(2)O(3)) and on metallic polycrystal As. Surface tension of Ga was remarkably decreased by a kind of oxide contamination
due to oxygen in air. The surface layer coated by the contamination was of amorphous state nearly same as liquid Ga. The amorphous coat caused liquid Ga rather high supercooling of △T~35K. It seems that the contamination layer (oxide fi1m) smeared the crystal nucleation sites on the free surface of liquid Ga
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出版物タイトル |
Memoirs of the Faculty of Engineering, Okayama University
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発行日 | 1989-03-30
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巻 | 23巻
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号 | 2号
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出版者 | Faculty of Engineering, Okayama University
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出版者(別表記) | 岡山大学工学部
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開始ページ | 1
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終了ページ | 8
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ISSN | 0475-0071
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NCID | AA10699856
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資料タイプ |
紀要論文
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OAI-PMH Set |
岡山大学
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言語 |
英語
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論文のバージョン | publisher
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NAID | |
Eprints Journal Name | mfe
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