溶媒浮選法による有機塩素化合物の処理

Removal of chlorinated compound from an aqueous solution has been studied using solvent sublation. Solvent sublation is one among the several adsorptive bubble separation techniques wherein a hydrophobic compound is levitated on a bubble surface to the top of an aqueous column where they encounter a solvent layer to which the material is transferred as the bubbles move through the solvent layer. A model for the removal mechanism of the chlorinated compounds from aqueous solution was constructed. Removal rate constants for air stripping and for solvent sublation respectively are possible to calculate from the model's equations. The experiments were conducted on a laboratory batch scale using the 0.1m inner diameter bubble column. Bubbles were generated from the perforated plate. The chlorinated compound is dichrolomethane. The solvent layer is kerosine. Dichrolometane was removed at high efficiency by solvent sublation as compared with conventional air stripping, The removal rate constant from the model was compared with experimental result. The mass adsorbed on the bubble surface of 8 types of chlorinated compounds were assumed by the measurements of surface tension. The removal rate constants of these chlorinated compounds, for solvent sublation or for air stripping, are calculated from model equations using the linear adsorption constant.

論文