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ID 15464
JaLCDOI
Sort Key
9
フルテキストURL
著者
尾坂 明義 Department of Applied Chemsitry ORCID Kaken ID publons researchmap
Kawamura Haruyuki Department of Applied Chemsitry
三浦 嘉也 Department of Applied Chemsitry
抄録
Amorphous films of lead oxyfluorosilicate were prepared with a rf-sputtering technique, and the distribution profiles of the component elements and chemical states of the fluoride ions were analyzed with an X-ray photoelectron spectrometer. Si atoms with an expanded coordination, O(4)Si-F, were present near the surface, and O(3)Si-F units were present in the deeper part of the films. Electrical resistance indicated transition to a conduction state for the films containing fluoride ions, while the films were crystallized to precipitate low quartz by the irradiation of He-Ne laser of 3 mW up to 1 sec.
出版物タイトル
Memoirs of the Faculty of Engineering, Okayama University
発行日
1994-03-15
28巻
2号
出版者
Faculty of Engineering, Okayama University
出版者(別表記)
岡山大学工学部
開始ページ
77
終了ページ
84
ISSN
0475-0071
NCID
AA10699856
資料タイプ
紀要論文
OAI-PMH Set
岡山大学
言語
English
論文のバージョン
publisher
NAID
Eprints Journal Name
mfe