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ID 34141
フルテキストURL
著者
Kubozono, Yoshihiro Okayama University ORCID Kaken ID publons researchmap
Nagano, Takayuki Okayama University
Haruyama, Yusuke Okayama University
Kuwahara, Eiji Okayama University
Takayanagi, Toshio Okayama University ORCID Kaken ID publons researchmap
Ochi, Kenji Okayama University
Fujiwara, Akihiko Japan Advanced Institute of Science and Technology
抄録

Flexible C60 field-effect transistor (FET) device has been fabricated with polyimide gate insulator on the poly(ethylene terephthalate) substrate, and n-channel normally-off FET properties are observed in this FET device. The field-effect mobility, ?, is estimated to be ~10-2 cm2 V-1 s-1 at 300 K. Furthermore, the C60 FET has been fabricated with high dielectric Ba0.4Sr0.6Ti0.96O3 (BST) gate insulator, showing n-channel properties; the ? value is estimated to be ~10-4 cm2 V-1 s-1 at 300 K. The FET device operates at very low gate voltage, VG, and low drain-source voltage, VDS. Thus these C60 FET devices possess flexibility and low-voltage operation characteristic of polyimide and BST gate insulators, respectively.

キーワード
fullerene devices
insulated gate field effect transistors
polymers
barium compounds
strontium compounds
dielectric materials
備考
Digital Object Identifier:10.1063/1.2081134
Published with permission from the copyright holder. This is the institute's copy, as published in Applied Physics Letter, 3 October 2005, 87, 143506, (3 Pages).
Publisher URL:http://dx.doi.org/10.1063/1.2081134
Copyright © 2005 American Institute of Physics. All rights reserved.
発行日
2005-10
出版物タイトル
Applied Physics Letters
87巻
14号
資料タイプ
学術雑誌論文
言語
英語
査読
有り
DOI
Submission Path
physics_general/3