このエントリーをはてなブックマークに追加
ID 34161
フルテキストURL
著者
Fujioka, Shinsuke Osaka University
Nishimura, Hiroaki Osaka University
Nishihara, Katsunobu Osaka University
Sasaki, Akira Advanced Photon Research Center Kaken ID publons researchmap
Sunahara, Atsushi Institute for Laser Technology
Okuno, Tomoharu Osaka University
Ueda, Nobuyoshi Osaka University
Ando, Tsuyoshi Osaka University
Tao, Yezheng Osaka University
Shimada, Yoshinori Institute for Laser Technology
Hashimoto, Kazuhisa Institute for Laser Technology
Yamaura, Michiteru Institute for Laser Technology
Shigemori, Keisuke Osaka University
Nakai, Mitsuo Osaka University
Nagai, Keiji Osaka University
Norimatsu, Takayoshi Osaka University
Nishikawa, Takeshi Okayama University Kaken ID publons researchmap
Miyanaga, Noriaki Osaka University
Izawa, Yasukazu Osaka University
Mima, Kunioki Osaka University
抄録

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

キーワード
emission
targets
lithography
fusion
備考
Digital Object Identifer:10.1103/PhysRevLett.95.235004
Published with permission from the copyright holder. This is the institute's copy, as published in Physical Review Letters, November 2005, Volume 95, Issue 23, Pages 4.
Publisher URL:http://dx.doi.org/10.1103/PhysRevLett.95.235004
Direct access to Thomson Web of Science record
Copyright © 2005 The American Physical Society. All rights reserved.
発行日
2005-11
出版物タイトル
Physical Review Letters
95巻
23号
資料タイプ
学術雑誌論文
言語
English
査読
有り
DOI
Web of Science KeyUT
Submission Path
physics_general/19