Memoirs of the Faculty of Engineering, Okayama University
Published by Faculty of Enginerring, Okayama University

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Memoirs of the School of Engineering, Okayama University

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Chemical States of Fluorine Atoms and Laser-Induced Crystallization in rf-Sputtered Thin Films of Amorphous Lead Fluorosilicate

尾坂 明義 Department of Applied Chemsitry
Kawamura Haruyuki Department of Applied Chemsitry
三浦 嘉也 Department of Applied Chemsitry
抄録
Amorphous films of lead oxyfluorosilicate were prepared with a rf-sputtering technique, and the distribution profiles of the component elements and chemical states of the fluoride ions were analyzed with an X-ray photoelectron spectrometer. Si atoms with an expanded coordination, O(4)Si-F, were present near the surface, and O(3)Si-F units were present in the deeper part of the films. Electrical resistance indicated transition to a conduction state for the films containing fluoride ions, while the films were crystallized to precipitate low quartz by the irradiation of He-Ne laser of 3 mW up to 1 sec.
ISSN
0475-0071
NCID
AA10699856