"Yoshifumi;Yamashita|Yoshifumi;Sakamoto|Yoichi;Kamiura|Takeshi;Ishiyama|","Formation of low-resistivity region in p-Si substrate of SiGe/Si episystem by remote-hydrogen plasma treatment","Physica B-Condensed Matter","","2008-06-29","401","","218","221","","","000252041000051","http://escholarship.lib.okayama-u.ac.jp/34153","10.1016/j.physb.2007.08.150"